Everything You Need To Know To Find The Best titanium sputtering targets

Titanium (Ti) Sputtering Targets Overview

Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here.

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Titanium (Ti) General Information

Titanium is a common material found in a myriad of products including watches, drill bits, laptops, and bicycles, just to name a few. In pure form, it is lustrous and silvery-white in appearance. It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material which is easily fabricated when heat is applied. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is biocompatible so it can be found in surgical tools and implants. Titanium is generally evaporated in vacuum for the purposes of wear and decorative, semiconductor, and optical coatings.

Titanium (Ti) Specifications

* This is a recommendation based on our experience running these materials in KJLC guns. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.

In order to better understand titanium sputtering targets, it is first important to understand titanium.

Titanium is a metallic element that is known for its strength and durability. The relatively high melting point (more than 1,650&#; or 3,000&#; ) makes it useful as a refractory metal. Titanium sputtering targets are made from titanium metal and are used in a process called sputter coating.

If you want to learn more, please visit our website Advanced Targets.

The titanium targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. There are two main methods for making titanium sputtering targets: melting and casting.

Melting: the metal is heated to a high temperature until it becomes liquid. It is then poured into a mold and allowed to cool, resulting in a solidified target.

Casting: the metal is placed in a vacuum chamber and bombarded with high-energy particles. This causes the metal to vaporize, and as it cools, it condenses onto the surface of the target.

It is one of the core materials for preparing integrated circuits, and purity usually requires over 99.99%. AEM offers Titanium alloy targets such as Tungsten Titanium (W/Ti 90/10 wt%) Sputtering Target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target density can reach over 14.24 g/cm3, and the purity can reach 99.995%.